01465nam a2200373Ia 4500001001000000003000700010005001700017006001900034007001500053008004100068020003600109020002700145035002200172035002300194035002500217035002300242035002100265040004100286050002500327082001700352100002600369245012900395260004800524300002400572590014700596650006600743650005500809650003500864655002900899710002800928797002000956856009600976999001901072EBC843655MiAaPQ20250821120017.0m     o  d |      cr cnu||||||||111017s2012    njua    o     000 0 eng d  a9781118273111q(electronic bk.)  z9781118243046q(print)  a(MiAaPQ)EBC843655  a(Au-PeEL)EBL843655  a(CaPaEBR)ebr10538699  a(CaONFJC)MIL362189  a(OCoLC)779165215  aMiAaPQbengerdaepncMiAaPQdMiAaPQ 4aTK7874.65b.D66 20120 a621.38152231 aDoman, David.939003810aEngineering the CMOS libraryh[electronic resource] :benhancing digital design kits for competitive silicon /cDavid Doman.  aHoboken, N.J. :bJohn Wiley & Sons,cc2012.  axiv, 327 p. :bill.  aElectronic reproduction. Ann Arbor, MI : ProQuest, 2018. Available via World Wide Web. Access may be limited to ProQuest affiliated libraries. 0aDigital integrated circuitsxDesign and construction.9390039 0aMetal oxide semiconductors, Complementary.9390040 0aIndustrial efficiency.9390041 4aElectronic books.9351422 aProQuest (Firm)93900422 aProQuest (Firm)40uhttps://ebookcentral.proquest.com/lib/kuct-ebooks/detail.action?docID=843655zClick to View  c281195d281195