TY  - BOOK
AU  - He,Gang
AU  - Sun,Zhaoqi
ED  - ProQuest (Firm)
TI  - High-k gate dielectrics for CMOS technology
AV  - QC585 .H54 2012
U1  - 538.24 23
PY  - 2012///
CY  - Weinheim
PB  - Wiley-VCH
KW  - Dielectrics
KW  - Metal oxide semiconductors, Complementary
KW  - Electronic books
N1  - Includes bibliographical references and index; pt. 1. Scaling and challenging of Si-based CMOS -- pt. 2. High-k deposition and materials characterization -- pt. 3. Challenge in interface engineering and electrode -- pt. 4. Development in non-Si-based CMOS technology -- pt. 5. High-k Application in novel devices -- pt. 6. Challenge and directions; Electronic reproduction. Ann Arbor, MI : ProQuest, 2015. Available via World Wide Web. Access may be limited to ProQuest affiliated libraries
UR  - https://ebookcentral.proquest.com/lib/kuct-ebooks/detail.action?docID=956000
ER  -